Skip to Content

College of Engineering and Computing

Undergraduate Scholarships

Separate Application Scholarships for Freshmen

There are a few scholarships that require a separate application process. Many of these scholarships are available because of the generous donations of CEC supporters – both individual and corporate.

Rothberg Scholarship for Incoming Freshmen

Incoming freshmen pursuing undergraduate degrees in chemical engineering with strong academic records who have been involved in high school and community leadership may be selected to receive Henry M. Rothberg Bicentennial Scholarships.
Incoming freshmen must submit a Rothberg Scholarship application by February 15 for consideration. For more information, contact the Department of Chemical Engineering at 803-777-4181.
Application (pdf)
Email: Loretta Hardcastle at

SPUR Scholars:  Need-based Aid for Incoming Freshmen

Incoming freshmen in the College of Engineering and Computing with significant financial need as determined by the FAFSA are invited to apply to the SPUR Scholars program. SPUR scholarship support ranges from $2,000 to $10,000 per year depending on financial need. The program provides student success programming specifically developed for engineering and computing majors.  This programming includes academic support, professional development and personal wellness. The SPUR Scholars program is meant to augment other support students may be eligible for (Opportunity Scholars, Honors College, Capstone Scholars, etc.). The SPUR Scholars program is funded by the National Science Foundation, S-STEM Award #1930492.

An application workshop and information session will be held Saturday, March 14, 2020. Travel grants to attend the workshop will be provided to qualified students.

Students interested in the SPUR Scholars program should contact Dr. Ed Gatzke at or (803) 777-1159 to receive information on the application process and to register for the application workshop and information session.

Challenge the conventional. Create the exceptional. No Limits.